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Langmuir probe diagnostic studies of pulsed hydrogen plasmas in planar microwave reactors

机译:Langmuir探针对平面脉冲氢等离子体的诊断研究   微波反应堆

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摘要

Langmuir probe techniques have been used to study time and spatially resolvedelectron densities and electron temperatures in pulse-modulated hydrogendischarges in two different planar microwave reactors (fmicrowave= 2.45 GHz,tpulse= 1 ms). The reactors are (i) a standing-wave radiative slotted waveguidereactor and (ii) a modified travelling-wave radiative slotted waveguidereactor, which generate relatively large plasmas over areas from about 350 cm^2to 500 cm^2. The plasma properties of these reactor types are of particularinterest as they have been used for basic research and for plasma processing,e.g. for surface treatment and layer deposition. In the present study thepressures and microwave powers in the reactors were varied between 33 and 55 Paand 600 and 3600 W, respectively. In regions with high electromagnetic fieldsshielded Langmuir probes were used to avoid disturbances of the probecharacteristic. Close to the microwave windows of the reactors both theelectron density and the electron temperature showed strong inhomogeneities. Inthe standing-wave reactor the inhomogeneity was found to be spatially modulatedby the position of the slots. The maximum value of the electron temperature wasabout 10 eV and the electron density varied between 0.2 and 14*10^11 cm^-3. Thesteady state electron temperature in a discharge pulse was reached within a fewtens of microseconds whereas the electron density needed some hundreds ofmicroseconds to reach a steady state. Depending on the reactor the electrondensity reached a maximum between 80 and 200 microseconds after the beginningof the pulse.
机译:Langmuir探针技术已被用于研究在两个不同的平面微波反应器(fmicrowave = 2.45 GHz,tpulse = 1 ms)中脉冲调制的氢放电中的时间和空间分辨电子密度以及电子温度。这些反应器是(i)驻波辐射缝隙波导反应器和(ii)改进的行波辐射缝隙波导反应器,其在约350cm 2至500cm 2的面积上产生相对大的等离子体。这些反应器类型的等离子体性质特别令人关注,因为它们已被用于基础研究和等离子体处理,例如。用于表面处理和层沉积。在本研究中,反应器中的压力和微波功率分别在33至55 Pa和600至3600 W之间变化。在电磁场强的地区,使用屏蔽的Langmuir探针来避免干扰探针的特性。靠近反应器的微波窗口,电子密度和电子温度都显示出很强的不均匀性。在驻波反应堆中,发现不均匀性是由缝隙的位置在空间上调节的。电子温度的最大值约为10eV,电子密度在0.2和14×10 ^ 11cm ^ -3之间变化。放电脉冲中的稳态电子温度在几十微秒内达到,而电子密度需要几百微秒才能达到稳态。取决于反应堆,电子密度在脉冲开始后达到80到200微秒之间的最大值。

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